Surface Morphology of Nisi2/Si Films Produced By Solid-Phase Epitaxy
Keywords:
NiSi2 nanofilms, surface structure, Auger electron spectroscopy, solid phase deposition, morphologyAbstract
The methods of Oje electron spectroscopy, scanning electron and atomic force microscopy were used to study the formation of NiSi2 epitaxial layers during the deposition of Ni in Si with subsequent annealing. It has been shown that island thicknesses NiSi2 are formed at thicknesses h <150 Å.